Characterization of hydrogenated amorphous silicon thin films deposited at high rate by optimized PCVD

優化等離子體化學汽相沉積法高速制備的氫化非晶矽薄膜的性能硏究

Student thesis: Doctoral Thesis

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Author(s)

  • Shunhui LIN

Related Research Unit(s)

Detail(s)

Awarding Institution
Supervisors/Advisors
Award date31 Jul 2001

    Research areas

  • Semiconductor films, Silicon, Thin film devices