A study of electron trap behaviours at high field and conduction mechanisms in thin thermally nitrided oxide films for VLSI technology

Student thesis: Doctoral Thesis

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Author(s)

  • Bing Liang YANG

Related Research Unit(s)

Detail(s)

Awarding Institution
Supervisors/Advisors
  • Yiu Chung CHENG (Supervisor)
Award date10 Apr 1996

    Research areas

  • Silicon oxide films, Very large scale integration, Integrated circuits, Semiconductors