Plasma implantation and deposition for advanced materials surface modification

Abstract

The research work described in this thesis focuses on the physics of plasma implantation and deposition as well as the application of the technology to materials synthesis and surface modification. Plasma implantation and deposition is investigated from both the theoretical and experimental points of view. Discharge enhancement of gaseous plasmas by resonant absorption and surface activation of silicon by hydrogen implantation to induce and improve optical and biological properties are discussed in Chapter 2. Chapter 3 discusses metal plasma discharge and the transport efficiency in a curved duct. In addition, hybrid processes combining reactive gas species and metal plasmas for implantation and thin film deposition are described in Chapter 3. Insulating materials such as polymers, ceramics, and dielectric materials are difficult to process by plasma implantation due to capacitance and surface charging effects. Numerical simulation and experimental investigation of the plasma sheath configuration and charging dynamics as well as plasma treatment of several functional insulating materials are described in Chapter 4. The mechanism of high-voltage glow discharge without an external plasma source and evaporation plasma discharge and application of the techniques to advanced materials synthesis are described in Chapter 5. Chapter 6 covers the conclusion and suggests for future work.

Date of Award	15 Jul 2005
Original language	English
Awarding Institution	City University of Hong Kong
Supervisor	Paul Kim Ho CHU (Supervisor)