XPS study on the effects of thermal annealing on CeO2/La2O3 stacked gate dielectrics

Research output: Conference Papers › RGC 32 - Refereed conference paper (without host publication) › peer-review

Original language	English
Publication status	Published - 1 Nov 2015
Event	TENCON 2015 - 2015 IEEE Region 10 Conference - , Macao, China Duration: 1 Nov 2015 → 4 Nov 2015

Conference	TENCON 2015 - 2015 IEEE Region 10 Conference
Place	Macao, China
Period	1/11/15 → 4/11/15

Other Access Options

@conference{69db334575eb48dea5e228bee7f1e2d3,

title = "XPS study on the effects of thermal annealing on CeO2/La2O3 stacked gate dielectrics",

author = "Jieqiong Zhang and Hei Wong and Kuniyuki Kakushima and Hiroshi Iwai",

year = "2015",

month = nov,

day = "1",

language = "English",

note = "TENCON 2015 - 2015 IEEE Region 10 Conference ; Conference date: 01-11-2015 Through 04-11-2015",

}

TY - CONF

T1 - XPS study on the effects of thermal annealing on CeO2/La2O3 stacked gate dielectrics

AU - Zhang, Jieqiong

AU - Wong, Hei

AU - Kakushima, Kuniyuki

AU - Iwai, Hiroshi

PY - 2015/11/1

Y1 - 2015/11/1

M3 - RGC 32 - Refereed conference paper (without host publication)

T2 - TENCON 2015 - 2015 IEEE Region 10 Conference

Y2 - 1 November 2015 through 4 November 2015

ER -