Vertical nanostructure arrays by plasma etching for applications in biology, energy, and electronics

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journal

48 Scopus Citations
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Author(s)

  • B. He
  • Y. Yang
  • M. F. Yuen
  • X. F. Chen

Detail(s)

Original languageEnglish
Pages (from-to)265-289
Journal / PublicationNano Today
Volume8
Issue number3
Publication statusPublished - Jun 2013

Abstract

Plasma etching, a conventional technique in semiconductor industry, has exhibited great potentials in fabricating nanoscale patterns by taking advantage of its high anisotropic nature and fine controllability. Thus far, various gas mixtures and chemistries have been practically developed for etching a wide variety of materials, including semiconductors, oxides, glass, metals and polymers, to fabricate a broad range of vertical nanostructure arrays (VNAs). In this review paper, we will summarize the recent achievements in fabricating VNAs by plasma etching processes and their applications in biology, energy and electronics. The strategies in conjunction with microlithography or natural templates for fabricating various VNAs are outlined and the VNAs-based applications in diverse fields such as DNA sensors, biomimetic structures, solar cells, gas sensors, SERS, drug delivery, and field emission will be discussed in detail. Finally, the perspective of future studies is proposed. The widespread applications of the VNAs provide the conventional process of plasma etching a new opportunity to strut in the forefront of materials science.

Research Area(s)

  • Biology, Electronics, Energy, Plasma etching (reactive ion etching), Vertical nanostructure arrays (VNAs)