Van der Waals negative capacitance transistors

Xiaowei Wang, Peng Yu*, Zhendong Lei, Chao Zhu, Xun Cao, Fucai Liu, Lu You, Qingsheng Zeng, Ya Deng, Chao Zhu, Jiadong Zhou, Qundong Fu, Junling Wang, Yizhong Huang, Zheng Liu*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

230 Citations (Scopus)
15 Downloads (CityUHK Scholars)

Abstract

The Boltzmann distribution of electrons sets a fundamental barrier to lowering energy consumption in metal-oxide-semiconductor field-effect transistors (MOSFETs). Negative capacitance FET (NC-FET), as an emerging FET architecture, is promising to overcome this thermionic limit and build ultra-low-power consuming electronics. Here, we demonstrate steep-slope NC-FETs based on two-dimensional molybdenum disulfide and CuInP2S6 (CIPS) van der Waals (vdW) heterostructure. The vdW NC-FET provides an average subthreshold swing (SS) less than the Boltzmann’s limit for over seven decades of drain current, with a minimum SS of 28 mV dec−1. Negligible hysteresis is achieved in NC-FETs with the thickness of CIPS less than 20 nm. A voltage gain of 24 is measured for vdW NC-FET logic inverter. Flexible vdW NC-FET is further demonstrated with sub-60 mV dec−1 switching characteristics under the bending radius down to 3.8 mm. These results demonstrate the great potential of vdW NC-FET for ultra-low-power and flexible applications. © The Author(s) 2019.
Original languageEnglish
Article number3037
JournalNature Communications
Volume10
Online published10 Jul 2019
DOIs
Publication statusPublished - 2019
Externally publishedYes

Publisher's Copyright Statement

  • This full text is made available under CC-BY 4.0. https://creativecommons.org/licenses/by/4.0/

Fingerprint

Dive into the research topics of 'Van der Waals negative capacitance transistors'. Together they form a unique fingerprint.

Cite this