TY - JOUR
T1 - USE OF AMORPHOUS SILICON TO FORM SUPERCONDUCTING V//3Si.
AU - Lacey, J. A.
AU - Psaras, P. A.
AU - Tu, K. N.
AU - Wittmer, M.
N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].
PY - 1985/2
Y1 - 1985/2
N2 - V//3Si is a silicide which is known to be superconducting. The material exhibits a high transition temperature and has usually been formed in combination with other Vi//xSi//x non-superconducting compounds on crystalline silicon and polycrystalline. If V//3Si is formed in coexistence with a non-superconducting V//xSi//x compound, the critical transition temperature will be decreased and discontinuity will be formed in the film which will adversely affect the superconducting properties. In order to avoid this, continuous films of superconducting V//3Si can be formed by utilizing amorphous silicon as one of the major constituents.
AB - V//3Si is a silicide which is known to be superconducting. The material exhibits a high transition temperature and has usually been formed in combination with other Vi//xSi//x non-superconducting compounds on crystalline silicon and polycrystalline. If V//3Si is formed in coexistence with a non-superconducting V//xSi//x compound, the critical transition temperature will be decreased and discontinuity will be formed in the film which will adversely affect the superconducting properties. In order to avoid this, continuous films of superconducting V//3Si can be formed by utilizing amorphous silicon as one of the major constituents.
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M3 - RGC 21 - Publication in refereed journal
SN - 0018-8689
VL - 27
JO - IBM technical disclosure bulletin
JF - IBM technical disclosure bulletin
IS - 9
ER -