在低溫下任意表面上的納米碲電子器件的氣相沉積

Research output: Patents, Agreements and Assignments › RGC 51 - Patents (CityU)

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Author(s)

Related Research Unit(s)

Detail(s)

Original languageChinese (Traditional)
Filing number202310684717.1
Publication status
  • Accepted/In press/Filed - 9 Jun 2023

Link(s)

Check@CityULib
Permanent Link https://scholars.cityu.edu.hk/en/publications/publication(28222f00-31d0-49a7-a75c-18388f684f98).html

Citation Format(s)

[ RIS ] [ BibTeX ]
在低溫下任意表面上的納米碲電子器件的氣相沉積. / HO, Johnny Chung Yin (Inventor); MENG, You (Inventor); WANG, Wei (Inventor) et al.
Jun 09, 2023.

Research output: Patents, Agreements and Assignments › RGC 51 - Patents (CityU)