Abstract
Neatly scratching the surface : A facile etching technique assisted by a silver‐nanoparticle network to produce large‐area 1D silicon nanostructure arrays with desired orientation and doping characteristics is demonstrated (see picture). A mechanism for the highly selective etching is proposed on the basis of experimental evidence.
| Original language | English |
|---|---|
| Pages (from-to) | 2737-2742 |
| Journal | Angewandte Chemie - International Edition |
| Volume | 44 |
| Issue number | 18 |
| Online published | 6 Apr 2005 |
| DOIs | |
| Publication status | Published - 29 Apr 2005 |
Research Keywords
- electrochemistry
- nanostructures
- semiconductors
- silicon
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