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Ultra-Shallow Junction Measurements: Optimizing SIMS for Implanted and Processed Wafers

Research output: Conference PapersRGC 32 - Refereed conference paper (without host publication)peer-review

Original languageEnglish
Pages180
Publication statusPublished - Sept 1997
Externally publishedYes
Event11th International Conference on Second Ion Mass Spectrometry - Hilton Hotel, Walt Disney World, Orlando, United States
Duration: 7 Sept 199712 Sept 1997

Conference

Conference11th International Conference on Second Ion Mass Spectrometry
Abbreviated titleSIMS XI
PlaceUnited States
CityOrlando
Period7/09/9712/09/97

Bibliographical note

Publication information for this record has been verified with the author(s) concerned.

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