Abstract
Black phosphorus (BP), consisting of a weak van der Waals interlayer interaction and strong in-plane bonds, has high carrier mobility and tunable band gap (0.3-2.0 eV), offering properties for electric and optoelectronic devices [1-3]. Here, we report a controllable thinning method by using hydrogen plasma etching to thin down mechanically exfoliated BP flakes.
| Original language | English |
|---|---|
| Pages | 202-203 |
| Publication status | Published - Oct 2017 |
| Event | 14th International Conference on Plasma Based Ion Implantation & Deposition (PBII&D 2017) - New World Shanghai Hotel, Shanghai, China Duration: 17 Oct 2017 → 20 Oct 2017 |
Conference
| Conference | 14th International Conference on Plasma Based Ion Implantation & Deposition (PBII&D 2017) |
|---|---|
| Abbreviated title | PBII&D 2017 |
| Place | China |
| City | Shanghai |
| Period | 17/10/17 → 20/10/17 |
Research Keywords
- Black phosphorus
- plasma etching
- thickness control
Fingerprint
Dive into the research topics of 'Tuning the thickness of black phosphorus via hydrogen plasma treatment'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver