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Tuning exchange bias in epitaxial Ni/MgO/TiN heterostructures integrated on Si(100)

F. Wu*, S.S. Rao, J.T. Prater, Y.T. Zhu, J. Narayan

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Epitaxial Ni thin films are integrated with tunneling barrier MgO on Si(100) substrate. During pulsed laser deposition, early island-like structure transformed into uniform thin film with increasing number of laser pulses. This led to transitions in exchange bias from positive to negative and back to positive, which is ascribed to morphology associated residual strain. The Ni island structure has a coercive field as high as 3 times of that of the continuous film. The current work holds a tremendous promise in the realization of magnetic devices integrated with the Si-platform.
Original languageEnglish
Pages (from-to)263-268
JournalCurrent Opinion in Solid State and Materials Science
Volume18
Issue number5
Online published27 Sept 2014
DOIs
Publication statusPublished - Oct 2014
Externally publishedYes

Research Keywords

  • Domain matching epitaxy
  • Epitaxial Ni thin films
  • Exchange bias
  • Pulsed laser deposition

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