TY - JOUR
T1 - Trimming of high-Q-factor silicon ring resonators by electron beam bleaching
AU - Prorok, Stefan
AU - Petrov, Alexander Yu.
AU - Eich, Manfred
AU - Luo, Jingdong
AU - Jen, Alex K.-Y.
PY - 2012/8/1
Y1 - 2012/8/1
N2 - We demonstrate a novel position-resolved resonance trimming strategy for silicon ring resonators. Ring resonators are covered with a chromophore-doped guest host polymer cladding. Illumination of the polymer cladding with high-energy electrons causes a bleaching of the chromophore molecules. Bleaching of the chromophores induces a reduction of the polymer refractive index, which can be used to trim the resonance frequency of the ring resonators. A maximum refractive index change of 0.06 and a TM polarization resonance shift of 16.4 nm have been measured. A Q factor of 20,000 before bleaching remains unaltered after the electron beam exposure process.
AB - We demonstrate a novel position-resolved resonance trimming strategy for silicon ring resonators. Ring resonators are covered with a chromophore-doped guest host polymer cladding. Illumination of the polymer cladding with high-energy electrons causes a bleaching of the chromophore molecules. Bleaching of the chromophores induces a reduction of the polymer refractive index, which can be used to trim the resonance frequency of the ring resonators. A maximum refractive index change of 0.06 and a TM polarization resonance shift of 16.4 nm have been measured. A Q factor of 20,000 before bleaching remains unaltered after the electron beam exposure process.
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U2 - 10.1364/OL.37.003114
DO - 10.1364/OL.37.003114
M3 - RGC 21 - Publication in refereed journal
SN - 0146-9592
VL - 37
SP - 3114
EP - 3116
JO - Optics Letters
JF - Optics Letters
IS - 15
ER -