Transmission characteristics of a coaxial through-silicon via (C-TSV) interconnect

Wen-Sheng Zhao, Yong-Xin Guo, Wen-Yan Yin

Research output: Chapters, Conference Papers, Creative and Literary WorksRGC 32 - Refereed conference paper (with host publication)peer-review

8 Citations (Scopus)

Abstract

Transmission characteristics of a coaxial through-silicon via (C-TSV) interconnect are studied according to our proposed lumped-element circuit model in this paper, with some numerical results given for their design as well as optimization. The influences of their geometrical and physical parameters involved on their transmission and reflection parameters are examined and compared in detail, such as substrate conductivity, radius of the inner cylinder and its electrical conductivity, etc. It is expected that C-TSVs are better choices than that of normal TSV interconnects for effectively suppressing electromagnetic coupling among them, with signal transmission quality improved greatly. Finally, based on our own developed algorithm, the electrothermal responses of a C-TSV interconnect injected with a trapezoidal voltage pulse are also studied, with the temperature-dependent parameters treated appropriately. © 2011 IEEE.
Original languageEnglish
Title of host publicationEMC 2011 - Proceedings: 2011 IEEE International Symposium on Electromagnetic Compatibility
Pages373-378
DOIs
Publication statusPublished - 2011
Externally publishedYes
Event2011 IEEE International Symposium on Electromagnetic Compatibility, EMC 2011 - Long Beach, CA, United States
Duration: 14 Aug 201119 Aug 2011

Publication series

NameIEEE International Symposium on Electromagnetic Compatibility
ISSN (Print)1077-4076

Conference

Conference2011 IEEE International Symposium on Electromagnetic Compatibility, EMC 2011
PlaceUnited States
CityLong Beach, CA
Period14/08/1119/08/11

Bibliographical note

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