Transformation of enhanced glow discharge dynamics in nitrogen plasma immersion ion implantation

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Qiuyuan Lu
  • Liuhe Li
  • Penghui Li
  • Ruizhen Xu
  • Ricky King-Yu Fu

Detail(s)

Original languageEnglish
Article number6471837
Pages (from-to)553-558
Journal / PublicationIEEE Transactions on Plasma Science
Volume41
Issue number3
Publication statusPublished - 2013

Abstract

In nitrogen enhanced glow discharge plasma immersion ion implantation, the implantation current increases sharply with the gas pressure when a threshold pressure is exceeded, indicating that the glow discharge dynamics changes with increasing diatomic gas flow rate. The voltage drop rendered by the anode glow produces noticeable N2 + dissociation and electron-atom ionization in the positive column which expands to the cathode. As a result, charged particles reach the cathode more easily, and the larger plasma density and N+/N2 + ratio in the positive column lead to the higher current. Our results clarify the implantation current characteristics and expedite adoption of this alternative plasma immersion technology. © 1973-2012 IEEE.

Research Area(s)

  • Glow discharge, implantation current, ionization, plasma immersion ion implantation (PIII), voltage drop

Citation Format(s)

Transformation of enhanced glow discharge dynamics in nitrogen plasma immersion ion implantation. / Lu, Qiuyuan; Li, Liuhe; Li, Penghui; Xu, Ruizhen; Fu, Ricky King-Yu; Chu, Paul K.

In: IEEE Transactions on Plasma Science, Vol. 41, No. 3, 6471837, 2013, p. 553-558.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review