Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

D. Gupta; K. N. Tu; K. W. Asai

doi:10.1016/0040-6090(82)90632-0

Tracer diffusion in amorphous Pd₈₀Si₂₀ and Gd₁₆Co₈₄ films

D. Gupta
, K. N. Tu
, K. W. Asai

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

6 Citations (Scopus)

Abstract

Evaporated Pd₈₀Si₂₀ and sputtered Gd₁₆Co₈₄ amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au¹⁹⁵ and Co⁵⁷ tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.

Original language	English
Pages (from-to)	131-137
Journal	Thin Solid Films
Volume	90
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(82)90632-0
Publication status	Published - 16 Apr 1982
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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title = "Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films",

abstract = "Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. {\textcopyright} 1982.",

author = "D. Gupta and Tu, \{K. N.\} and Asai, \{K. W.\}",

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AU - Gupta, D.

AU - Tu, K. N.

AU - Asai, K. W.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 1982/4/16

Y1 - 1982/4/16

N2 - Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.

AB - Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.

UR - https://www.scopus.com/pages/publications/0019553760

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U2 - 10.1016/0040-6090(82)90632-0

DO - 10.1016/0040-6090(82)90632-0

M3 - RGC 21 - Publication in refereed journal

SN - 0040-6090

VL - 90

SP - 131

EP - 137

JO - Thin Solid Films

JF - Thin Solid Films

IS - 2

ER -