Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

6 Scopus Citations
View graph of relations

Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)131-137
Journal / PublicationThin Solid Films
Volume90
Issue number2
Publication statusPublished - 16 Apr 1982
Externally publishedYes

Abstract

Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.

Bibliographic Note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to lbscholars@cityu.edu.hk.

Citation Format(s)

Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films. / Gupta, D.; Tu, K. N.; Asai, K. W.

In: Thin Solid Films, Vol. 90, No. 2, 16.04.1982, p. 131-137.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review