Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 131-137 |
Journal / Publication | Thin Solid Films |
Volume | 90 |
Issue number | 2 |
Publication status | Published - 16 Apr 1982 |
Externally published | Yes |
Link(s)
Abstract
Evaporated Pd80Si20 and sputtered Gd16Co84 amorphous films were studied for structural relaxation during annealing with a Seeman-Bohlin X-ray diffractometer and for atomic diffusion using radioactive Au195 and Co57 tracers. The diffusion parameters for these two kinds of films with pre-annealing are presented. © 1982.
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Citation Format(s)
Tracer diffusion in amorphous Pd80Si20 and Gd16Co84 films. / Gupta, D.; Tu, K. N.; Asai, K. W.
In: Thin Solid Films, Vol. 90, No. 2, 16.04.1982, p. 131-137.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review