Three-dimensional Nano Etching Method for Noble Metal Substrate

貴金屬基材的 3 維納米蝕刻方法

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53)51_Patents granted (CityU only, data source from KTO)

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Author(s)

Detail(s)

Original languageEnglish
Patent numberZL201810696402.8
Filing number201810696402.8
Publication status
  • Accepted/In press/Filed - 29 Jun 2018
  • Published - 13 Apr 2021

Citation Format(s)

Three-dimensional Nano Etching Method for Noble Metal Substrate. / LI, Yangyang (Inventor); LU, Jian (Inventor); ZHAN, Yawen (Inventor).

Patent No.: ZL201810696402.8. Apr 13, 2021.

Research output: Patents, Agreements and Assignments (RGC: 51, 52, 53)51_Patents granted (CityU only, data source from KTO)