Three-dimensional nanofabrication with elastomeric phase masks

Daniel J. Shir; Seokwoo Jeon; Hongwei Liao; Matthew Highland; David G. Cahill; Mehmet F. Su; Ihab F. El-Kady; Christos G. Christodoulou; Gregory R. Bogart; Alex V. Hamza; John A. Rogers

doi:10.1021/jp074093j

Three-dimensional nanofabrication with elastomeric phase masks

Daniel J. Shir
, Seokwoo Jeon
, Hongwei Liao
, Matthew Highland
, David G. Cahill
, Mehmet F. Su
, Ihab F. El-Kady
, Christos G. Christodoulou
, Gregory R. Bogart
, Alex V. Hamza
, John A. Rogers^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

64 Citations (Scopus)

Abstract

This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science. © 2007 American Chemical Society.

Original language	English
Pages (from-to)	12945-12958
Journal	The Journal of Physical Chemistry B
Volume	111
Issue number	45
DOIs	https://doi.org/10.1021/jp074093j
Publication status	Published - 15 Nov 2007
Externally published	Yes

Bibliographical note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

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@article{2442e507635941c38b55c7cb111e9323,

title = "Three-dimensional nanofabrication with elastomeric phase masks",

abstract = "This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science. {\textcopyright} 2007 American Chemical Society.",

author = "Shir, \{Daniel J.\} and Seokwoo Jeon and Hongwei Liao and Matthew Highland and Cahill, \{David G.\} and Su, \{Mehmet F.\} and El-Kady, \{Ihab F.\} and Christodoulou, \{Christos G.\} and Bogart, \{Gregory R.\} and Hamza, \{Alex V.\} and Rogers, \{John A.\}",

note = "Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].",

year = "2007",

month = nov,

day = "15",

doi = "10.1021/jp074093j",

language = "English",

volume = "111",

pages = "12945--12958",

journal = "The Journal of Physical Chemistry B",

issn = "1520-6106",

publisher = "American Chemical Society",

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TY - JOUR

T1 - Three-dimensional nanofabrication with elastomeric phase masks

AU - Shir, Daniel J.

AU - Jeon, Seokwoo

AU - Liao, Hongwei

AU - Highland, Matthew

AU - Cahill, David G.

AU - Su, Mehmet F.

AU - El-Kady, Ihab F.

AU - Christodoulou, Christos G.

AU - Bogart, Gregory R.

AU - Hamza, Alex V.

AU - Rogers, John A.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2007/11/15

Y1 - 2007/11/15

N2 - This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science. © 2007 American Chemical Society.

AB - This Feature Article reviews recent work on an optical technique for fabricating, in a single exposure step, three-dimensional (3D) nanostructures with diverse structural layouts. The approach, which we refer to as proximity field nanopatterning, uses conformable, elastomeric phase masks to pattern thick layers of transparent, photosensitive materials in a conformal contact mode geometry. Aspects of the optics, the materials, and the physical chemistry associated with this method are outlined. A range of 3D structures illustrate its capabilities, and several application examples demonstrate possible areas of use in technologies ranging from microfluidics to photonic materials to density gradient structures for chemical release and high-energy density science. © 2007 American Chemical Society.

UR - https://www.scopus.com/pages/publications/36649014033

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-36649014033&origin=recordpage

U2 - 10.1021/jp074093j

DO - 10.1021/jp074093j

M3 - RGC 21 - Publication in refereed journal

SN - 1520-6106

VL - 111

SP - 12945

EP - 12958

JO - The Journal of Physical Chemistry B

JF - The Journal of Physical Chemistry B

IS - 45

ER -

Three-dimensional nanofabrication with elastomeric phase masks

Abstract

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