Thick magnesium films produced by deposition techniques

T. G. Nieh; J. Wadsworth

doi:10.1016/0040-6090(87)90268-9

Thick magnesium films produced by deposition techniques

T. G. Nieh, J. Wadsworth

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

3 Citations (Scopus)

Abstract

Thick magnesium alloy films were prepared by both vapor deposition and sputter deposition techniques. It was found that the properties of the deposited films depend on the substrate material, deposition temperature and release agent, as well as substrate motion. Processing parameters were related to the physical integrity of the deposited film. A direct comparison between an alloy film produced by vapor deposition and an alloy film produced by sputter deposition was also made. It is concluded that sputter deposition is superior to vapor deposition, as the former method can produce a film not only more uniform in thickness, but also with much closer control of chemical composition. © 1987.

Original language	English
Pages (from-to)	525-534
Journal	Thin Solid Films
Volume	152
Issue number	3
DOIs	https://doi.org/10.1016/0040-6090(87)90268-9
Publication status	Published - 28 Sept 1987
Externally published	Yes

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Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

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@article{ef4af4316eca4092882544e8f2d30abd,

title = "Thick magnesium films produced by deposition techniques",

abstract = "Thick magnesium alloy films were prepared by both vapor deposition and sputter deposition techniques. It was found that the properties of the deposited films depend on the substrate material, deposition temperature and release agent, as well as substrate motion. Processing parameters were related to the physical integrity of the deposited film. A direct comparison between an alloy film produced by vapor deposition and an alloy film produced by sputter deposition was also made. It is concluded that sputter deposition is superior to vapor deposition, as the former method can produce a film not only more uniform in thickness, but also with much closer control of chemical composition. {\textcopyright} 1987.",

author = "Nieh, {T. G.} and J. Wadsworth",

note = "Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].",

year = "1987",

month = sep,

day = "28",

doi = "10.1016/0040-6090(87)90268-9",

language = "English",

volume = "152",

pages = "525--534",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "3",

}

TY - JOUR

T1 - Thick magnesium films produced by deposition techniques

AU - Nieh, T. G.

AU - Wadsworth, J.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 1987/9/28

Y1 - 1987/9/28

N2 - Thick magnesium alloy films were prepared by both vapor deposition and sputter deposition techniques. It was found that the properties of the deposited films depend on the substrate material, deposition temperature and release agent, as well as substrate motion. Processing parameters were related to the physical integrity of the deposited film. A direct comparison between an alloy film produced by vapor deposition and an alloy film produced by sputter deposition was also made. It is concluded that sputter deposition is superior to vapor deposition, as the former method can produce a film not only more uniform in thickness, but also with much closer control of chemical composition. © 1987.

AB - Thick magnesium alloy films were prepared by both vapor deposition and sputter deposition techniques. It was found that the properties of the deposited films depend on the substrate material, deposition temperature and release agent, as well as substrate motion. Processing parameters were related to the physical integrity of the deposited film. A direct comparison between an alloy film produced by vapor deposition and an alloy film produced by sputter deposition was also made. It is concluded that sputter deposition is superior to vapor deposition, as the former method can produce a film not only more uniform in thickness, but also with much closer control of chemical composition. © 1987.

UR - http://www.scopus.com/inward/record.url?scp=0023418041&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0023418041&origin=recordpage

U2 - 10.1016/0040-6090(87)90268-9

DO - 10.1016/0040-6090(87)90268-9

M3 - RGC 21 - Publication in refereed journal

SN - 0040-6090

VL - 152

SP - 525

EP - 534

JO - Thin Solid Films

JF - Thin Solid Films

IS - 3

ER -

Thick magnesium films produced by deposition techniques

Abstract

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