The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering

Xiubo Tian; Zhongzhen Wu; Chunzhi Gong; Paul. K. Chu

The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering

Xiubo Tian^*
, Zhongzhen Wu
, Chunzhi Gong
, Paul. K. Chu

^*Corresponding author for this work

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Original language	English
Title of host publication	Proceedings International Conference on Metallurgical Coatings and Thin Films (ICMCTF)
Pages	39
Publication status	Published - 23 Apr 2012
Event	International Conference on Metallurgical Coatings and Thin Films (ICMCTF) - , United States Duration: 23 Apr 2012 → 27 Apr 2012

Conference

Conference	International Conference on Metallurgical Coatings and Thin Films (ICMCTF)
Place	United States
Period	23/04/12 → 27/04/12

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@inproceedings{be7b86c416eb4707a353f982223cd1b3,

title = "The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering",

author = "Xiubo Tian and Zhongzhen Wu and Chunzhi Gong and Chu, \{Paul. K.\}",

year = "2012",

month = apr,

day = "23",

language = "English",

pages = "39",

booktitle = "Proceedings International Conference on Metallurgical Coatings and Thin Films (ICMCTF)",

note = "International Conference on Metallurgical Coatings and Thin Films (ICMCTF) ; Conference date: 23-04-2012 Through 27-04-2012",

}

Tian, X, Wu, Z, Gong, C & Chu, PK 2012, The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering. in Proceedings International Conference on Metallurgical Coatings and Thin Films (ICMCTF). pp. 39, International Conference on Metallurgical Coatings and Thin Films (ICMCTF), United States, 23/04/12.

The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering. / Tian, Xiubo; Wu, Zhongzhen; Gong, Chunzhi et al.
Proceedings International Conference on Metallurgical Coatings and Thin Films (ICMCTF). 2012. p. 39.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

TY - GEN

T1 - The Uniformity in Thickness and Microstructure of CrN Films Fabricated Using Plasma Ion Implantation-Deposition Based on High Power Pulsed Magnetron Sputtering

AU - Tian, Xiubo

AU - Wu, Zhongzhen

AU - Gong, Chunzhi

AU - Chu, Paul. K.

PY - 2012/4/23

Y1 - 2012/4/23

M3 - RGC 32 - Refereed conference paper (with host publication)

SP - 39

BT - Proceedings International Conference on Metallurgical Coatings and Thin Films (ICMCTF)

T2 - International Conference on Metallurgical Coatings and Thin Films (ICMCTF)

Y2 - 23 April 2012 through 27 April 2012

ER -