The pitting corrosion behavior of aluminum ion implanted with titanium

X. Y. Yao; C. S. Kumai; T. M. Devine; P. B. Fojas; I. C. Ivanov; K.-M. Yu; I. G. Brown

doi:10.1016/0168-583X(93)96121-R

The pitting corrosion behavior of aluminum ion implanted with titanium

X. Y. Yao, C. S. Kumai, T. M. Devine, P. B. Fojas, I. C. Ivanov, K.-M. Yu, I. G. Brown

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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Abstract

The pitting corrosion behavior in deaerated 0.05M NaCl solution of titanium ion implanted aluminum has been investigated. The samples were implanted with Ti ions using a Mevva high current metal ion implantation facility at doses ranging from 2×10¹⁵ to 2×10¹⁷ ions/cm² and with ion energy from 30 to 120 keV, and the resultant Ti depth profiles were measured with Rutherford backscattering spectrometry (RBS). The pit density was decreased by up to two orders of magnitude relative to the unimplanted samples. The pitting potential increase ranged from 0.1 to 0.3 V. The pitting potential increase of the high dose samples was limited by pit formation at pre-existing scratches whereas the majority of the surface was free of pits to potentials up to 5 V_SCE. © 1993.

Original language	English
Pages (from-to)	267-270
Journal	Nuclear Inst. and Methods in Physics Research, B
Volume	80-81
Issue number	Part 1
DOIs	https://doi.org/10.1016/0168-583X(93)96121-R
Publication status	Published - 3 Jun 1993
Externally published	Yes

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@article{ec21c640e6e442bdbb7b46ac1f49c952,

title = "The pitting corrosion behavior of aluminum ion implanted with titanium",

abstract = "The pitting corrosion behavior in deaerated 0.05M NaCl solution of titanium ion implanted aluminum has been investigated. The samples were implanted with Ti ions using a Mevva high current metal ion implantation facility at doses ranging from 2×1015 to 2×1017 ions/cm2 and with ion energy from 30 to 120 keV, and the resultant Ti depth profiles were measured with Rutherford backscattering spectrometry (RBS). The pit density was decreased by up to two orders of magnitude relative to the unimplanted samples. The pitting potential increase ranged from 0.1 to 0.3 V. The pitting potential increase of the high dose samples was limited by pit formation at pre-existing scratches whereas the majority of the surface was free of pits to potentials up to 5 VSCE. {\textcopyright} 1993.",

author = "Yao, {X. Y.} and Kumai, {C. S.} and Devine, {T. M.} and Fojas, {P. B.} and Ivanov, {I. C.} and K.-M. Yu and Brown, {I. G.}",

year = "1993",

month = jun,

day = "3",

doi = "10.1016/0168-583X(93)96121-R",

language = "English",

volume = "80-81",

pages = "267--270",

journal = "Nuclear Inst. and Methods in Physics Research, B",

issn = "0168-583X",

publisher = "Elsevier B.V.",

number = "Part 1",

}

TY - JOUR

T1 - The pitting corrosion behavior of aluminum ion implanted with titanium

AU - Yao, X. Y.

AU - Kumai, C. S.

AU - Devine, T. M.

AU - Fojas, P. B.

AU - Ivanov, I. C.

AU - Yu, K.-M.

AU - Brown, I. G.

PY - 1993/6/3

Y1 - 1993/6/3

N2 - The pitting corrosion behavior in deaerated 0.05M NaCl solution of titanium ion implanted aluminum has been investigated. The samples were implanted with Ti ions using a Mevva high current metal ion implantation facility at doses ranging from 2×1015 to 2×1017 ions/cm2 and with ion energy from 30 to 120 keV, and the resultant Ti depth profiles were measured with Rutherford backscattering spectrometry (RBS). The pit density was decreased by up to two orders of magnitude relative to the unimplanted samples. The pitting potential increase ranged from 0.1 to 0.3 V. The pitting potential increase of the high dose samples was limited by pit formation at pre-existing scratches whereas the majority of the surface was free of pits to potentials up to 5 VSCE. © 1993.

AB - The pitting corrosion behavior in deaerated 0.05M NaCl solution of titanium ion implanted aluminum has been investigated. The samples were implanted with Ti ions using a Mevva high current metal ion implantation facility at doses ranging from 2×1015 to 2×1017 ions/cm2 and with ion energy from 30 to 120 keV, and the resultant Ti depth profiles were measured with Rutherford backscattering spectrometry (RBS). The pit density was decreased by up to two orders of magnitude relative to the unimplanted samples. The pitting potential increase ranged from 0.1 to 0.3 V. The pitting potential increase of the high dose samples was limited by pit formation at pre-existing scratches whereas the majority of the surface was free of pits to potentials up to 5 VSCE. © 1993.

UR - http://www.scopus.com/inward/record.url?scp=0001427873&partnerID=8YFLogxK

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0001427873&origin=recordpage

U2 - 10.1016/0168-583X(93)96121-R

DO - 10.1016/0168-583X(93)96121-R

M3 - RGC 21 - Publication in refereed journal

SN - 0168-583X

VL - 80-81

SP - 267

EP - 270

JO - Nuclear Inst. and Methods in Physics Research, B

JF - Nuclear Inst. and Methods in Physics Research, B

IS - Part 1

ER -

The pitting corrosion behavior of aluminum ion implanted with titanium

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