The mechanism of texture formation during film growth : The roles of preferential sputtering and shadowing
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 3007-3009 |
| Journal / Publication | Applied Physics Letters |
| Volume | 69 |
| Issue number | 20 |
| Publication status | Published - 11 Nov 1996 |
| Externally published | Yes |
Link(s)
Abstract
Nonequilibrium molecular dynamics simulations have been employed to develop a mechanistic model for the development of an out-plane (fiber) texture in polcrystalline thin films. The depositing atoms preferentially sputter film atoms from grains with high surface energies. As the film grows, an atomic shadowing mechanism leads to the lateral growth of the grains with a height advantage—eventually leading to the occlusion of randomly oriented grains.
Citation Format(s)
The mechanism of texture formation during film growth : The roles of preferential sputtering and shadowing. / Ying, Feng; Smith, Richard W.; Srolovitz, David J.
In: Applied Physics Letters, Vol. 69, No. 20, 11.11.1996, p. 3007-3009.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
