The mechanism of texture formation during film growth : The roles of preferential sputtering and shadowing

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

52 Scopus Citations
View graph of relations



Original languageEnglish
Pages (from-to)3007-3009
Journal / PublicationApplied Physics Letters
Issue number20
Publication statusPublished - 11 Nov 1996
Externally publishedYes


Nonequilibrium molecular dynamics simulations have been employed to develop a mechanistic model for the development of an out-plane (fiber) texture in polcrystalline thin films. The depositing atoms preferentially sputter film atoms from grains with high surface energies. As the film grows, an atomic shadowing mechanism leads to the lateral growth of the grains with a height advantage—eventually leading to the occlusion of randomly oriented grains.