The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species

W. J. Zhang; C. Y. Chan; X. M. Meng; M. K. Fung; I. Bello; Y. Lifshitz; S. T. Lee; X. Jiang

doi:10.1002/anie.200500320

Author(s)

C. Y. Chan
X. M. Meng
M. K. Fung
I. Bello
Y. Lifshitz
S. T. Lee
X. Jiang

Related Research Unit(s)

Centre of Super-Diamond and Advanced Films

Detail(s)

Original language	English
Pages (from-to)	4749-4753
Journal / Publication	Angewandte Chemie - International Edition
Volume	44
Issue number	30
Publication status	Published - 25 Jul 2005

Link(s)

DOI	DOI https://doi.org/10.1002/anie.200500320 Final Published version
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Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-23044486217&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(c7a18d76-ac5f-40b6-a298-750f3eb9a25d).html

Abstract

(Chemical Equation Presented) Growing pains: A new surface reaction mechanism for the growth of films of cubic BN (cBN) in an electron cyclotron resonance plasma fed with a reactive gas mixture (BF₃/H ₂/N₂) is revealed. The excited plasma contains reactive H, F, BF_x, and NH_x species which are responsible for the etching of hexagonal BN (mainly through F atoms) and for the growth of the cBN crystals (through BF_x and NH_x species; see picture). © 2005 Wiley-VCH Verlag GmbH & Co. KGaA.

Research Area(s)

Chemical vapor deposition, Crystal growth, Nitrides, Plasma chemistry, Reaction mechanisms

Citation Format(s)

[ RIS ] [ BibTeX ]

The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species. / Zhang, W. J.; Chan, C. Y.; Meng, X. M. et al.

In: Angewandte Chemie - International Edition, Vol. 44, No. 30, 25.07.2005, p. 4749-4753.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review

Zhang, WJ, Chan, CY, Meng, XM, Fung, MK, Bello, I, Lifshitz, Y, Lee, ST & Jiang, X 2005, 'The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species', Angewandte Chemie - International Edition, vol. 44, no. 30, pp. 4749-4753. https://doi.org/10.1002/anie.200500320

Zhang, W. J., Chan, C. Y., Meng, X. M., Fung, M. K., Bello, I., Lifshitz, Y., Lee, S. T., & Jiang, X. (2005). The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species. Angewandte Chemie - International Edition, 44(30), 4749-4753. https://doi.org/10.1002/anie.200500320

Zhang WJ, Chan CY, Meng XM, Fung MK, Bello I, Lifshitz Y et al. The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species. Angewandte Chemie - International Edition. 2005 Jul 25;44(30):4749-4753. doi: 10.1002/anie.200500320

Zhang, W. J. ; Chan, C. Y. ; Meng, X. M. et al. / The mechanism of chemical vapor deposition of cubic boron nitride films from fluorine-containing species. In: Angewandte Chemie - International Edition. 2005 ; Vol. 44, No. 30. pp. 4749-4753.