TY - JOUR
T1 - The influence of X-ray irradiation on structural relaxation and crystallization of amorphous silicon films
AU - Muto, Shunsuke
AU - Kobayashi, Yumiko
AU - Yu, Kin Man
AU - Walukiewicz, Wladyslaw
AU - Echer, Charles J.
AU - McCormick, Scott
AU - Abelson, John R.
PY - 1998/11
Y1 - 1998/11
N2 - The effect of intense X-ray irradiation on the short range structure and the thermal crystallization process in sputter deposited amorphous silicon films has been examined by extended energy-loss fine structure spectroscopy and transmission electron microscopy The coordination number and the mean square disorder of the first neighbor shell in the amorphous state were increased following X-ray irradiation. The crystallization by post-annealing was delayed, the crystallized particles were dispersed homogeneously throughout the film, and the size of the individual particles was larger than in samples without X-ray irradiation. The above facts suggest that the number of unsaturated bonds is reduced by the X-ray irradiation, which can suppress the atomic diffusion and rearrangement, necessary for the crystallization.
AB - The effect of intense X-ray irradiation on the short range structure and the thermal crystallization process in sputter deposited amorphous silicon films has been examined by extended energy-loss fine structure spectroscopy and transmission electron microscopy The coordination number and the mean square disorder of the first neighbor shell in the amorphous state were increased following X-ray irradiation. The crystallization by post-annealing was delayed, the crystallized particles were dispersed homogeneously throughout the film, and the size of the individual particles was larger than in samples without X-ray irradiation. The above facts suggest that the number of unsaturated bonds is reduced by the X-ray irradiation, which can suppress the atomic diffusion and rearrangement, necessary for the crystallization.
KW - Amorphous silicon
KW - Extended energy-loss fine structure
KW - Short range structure
KW - Thermal crystallization
KW - Transmission electron microscopy
KW - X-ray irradiation
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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-0032203391&origin=recordpage
U2 - 10.1143/jjap.37.5890
DO - 10.1143/jjap.37.5890
M3 - RGC 21 - Publication in refereed journal
SN - 0021-4922
VL - 37
SP - 5890
EP - 5893
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 11
ER -