The influence of electron oscillation on plasma transport through a magnetic duct

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)320-323
Journal / PublicationChinese Physics
Volume10
Issue number4
Publication statusPublished - 2001

Abstract

A magnetic duct is inserted between the cathodic arc plasma source and the chamber to eliminate the macroparticles. In this paper, the plasma output of the magnetic duct is determined as a function of the magnetic field and the bias voltage under the Bilek biasing mode and entire duct biasing mode. The computer simulation and the experimental result indicate that the E + (Combining right arrow above sign) x B + (Combining right arrow above sign) drift results in an extra diffusion flux under the Bilek biasing mode. The test verifying the electron oscillation was conducted in the magnetic duct biased in the Bilek mode. The electron behaviour under Bilek biasing mode is different from that under entire duct biasing mode. The Bilek biasing mode has a lower plasma output than the entire duct biasing mode. © 2001 Chin. Phys. Soc. and IOP Publishing Ltd.

Research Area(s)

  • Cathodic arc plasma, Computer simulation, Magnetic duct, Plasma transport

Citation Format(s)

The influence of electron oscillation on plasma transport through a magnetic duct. / Zhang, Tao; Kwok, T. K.; Chu, P. K. et al.
In: Chinese Physics, Vol. 10, No. 4, 2001, p. 320-323.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)22_Publication in policy or professional journal