The influence of boron contents on the microstructure and mechanical properties of Cr-B-N thin films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Jyh-Wei Lee
  • Chih-Hong Cheng
  • Hsien-Wei Chen
  • Li-Wei Ho
  • Jenq-Gong Duh
  • And 1 others
  • Yu-Chen Chan

Detail(s)

Original languageEnglish
Pages (from-to)191-194
Journal / PublicationVacuum
Volume87
Online published14 Mar 2012
Publication statusPublished - Jan 2013
Externally publishedYes

Abstract

Seven Cr-B-N films with various boron contents ranging from 3.7 to 20.6 at.% were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The structures of thin films were characterized by X-ray diffraction (XRD). The surface and cross-sectional morphologies of thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The surface roughness of thin films was explored by atomic force microscopy (AFM). A nanoindenter was used to evaluate the hardness and properties of thin films, respectively. The phases of each Cr-B-N coating were mainly CrN and amorphous BN regardless the boron content. It was found that the grain size decreased with increasing boron content. The hardness and elastic modulus of Cr-B-N thin films decreased with increasing boron concentration, which were mainly attributed to the nanostructure configuration of small CrN nanograins and large intergranular amorphous BN phase.

Research Area(s)

  • Amorphous BN, Cr-B-N nanocomposite thin film, Nanoindentation, Pulsed DC reactive magnetron sputtering

Citation Format(s)

The influence of boron contents on the microstructure and mechanical properties of Cr-B-N thin films. / Lee, Jyh-Wei; Cheng , Chih-Hong; Chen, Hsien-Wei; Ho, Li-Wei; Duh, Jenq-Gong; Chan, Yu-Chen.

In: Vacuum, Vol. 87, 01.2013, p. 191-194.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review