The extended growth of graphene oxide flakes using ethanol CVD

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • Jingfeng Huang
  • Melanie Larisika
  • W. H. Derrick Fam
  • Myra A. Nimmo
  • Christoph Nowak
  • I. Y. Alfred Tok

Detail(s)

Original languageEnglish
Pages (from-to)2945-2951
Journal / PublicationNanoscale
Volume5
Issue number7
Online published6 Feb 2013
Publication statusPublished - 7 Apr 2013
Externally publishedYes

Abstract

We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD). GO was used to catalyze the deposition of carbon on a substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS and AFM characterized the growth to be a reduced GO (RGO) of <5 layers. This newly grown RGO possesses lower defect density with larger and increased distribution of sp2 domains than chemically reduced RGO. Furthermore this method without optimization reduces the relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical electronic devices. © The Royal Society of Chemistry 2013.

Citation Format(s)

The extended growth of graphene oxide flakes using ethanol CVD. / Huang, Jingfeng; Larisika, Melanie; Fam, W. H. Derrick; He, Qiyuan; Nimmo, Myra A.; Nowak, Christoph; Tok, I. Y. Alfred.

In: Nanoscale, Vol. 5, No. 7, 07.04.2013, p. 2945-2951.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review