Synthesis of ZnO nanorod on Al-cathode for plasma intensity enhancement

A simple synthesis route to high-quality ZnO nanorod is reported, utilizing ZnO thin films grown by Filtered Pulse Cathodic Vacuum Arc (FPCVA) deposition as seed layers and continuous growth by hydrothermal methode. Depending upon the FPCVA deposited conditions, implanted voltages, thickness and annealing temperature of ZnO seed layer, the surface morphology of the ZoO nanorod on ZnO film was noticeably different The average diameters of the nanorod on AJ~cathodes varied from about 131 99 ± 23 87 to 418 17 ± 75 50 nm. The grown ZnO nanorod showed a high crystallinity with energy gap of 3.37 eV and low defect density confirmed by UV/VIS Spectrometer and photoluminescence spectrum (PL). Large-area growth, quasi-aligned, needle like structure and high aspect ratio indicates that the ZnO nanorods produced have potential application for electron emission in plasma source.

To demonstrated plasma enhancement, the ZnO nanorod coated cathodes were characterized by using ZnO nanorod as the emitter for plasma intensity enhancement In plasma source. The enhancement characteristics will be presented and discussed.