Surface smoothing effect of an amorphous thin film deposited by atomic layer deposition on a surface with nano-sized roughness

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

  • W. S. Lau
  • J. Zhang
  • X. Wan
  • J. K. Luo
  • Y. Xu

Detail(s)

Original languageEnglish
Article number27120
Journal / PublicationAIP Advances
Volume4
Issue number2
Publication statusPublished - Feb 2014
Externally publishedYes

Abstract

Previously, Lau (one of the authors) pointed out that the deposition of an amorphous thin film by atomic layer deposition (ALD) on a substrate with nano-sized roughness probably has a surface smoothing effect. In this letter, polycrystalline zinc oxide deposited by ALD onto a smooth substrate was used as a substrate with nano-sized roughness. Atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (XTEM) were used to demonstrate that an amorphous aluminum oxide thin film deposited by ALD can reduce the surface roughness of a polycrystalline zinc oxide coated substrate. © 2014 Author(s).