Surface segregation during deposition

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

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Detail(s)

Original languageEnglish
Pages (from-to)1793-1796
Journal / PublicationJournal of Applied Physics
Volume60
Issue number5
Publication statusPublished - 1 Sept 1986
Externally publishedYes

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DOI

DOI
Check@CityULib
Link to Scopus https://www.scopus.com/record/display.uri?eid=2-s2.0-36549094711&origin=recordpage
Permanent Link https://scholars.cityu.edu.hk/en/publications/publication(be6e01e0-5ec5-4727-8911-99800d1c4877).html

Abstract

Both the steady-state and transient solute (impurity) concentrations at the surface of a film during its deposition are calculated as a function of deposition rate, temperature, diffusivity, bulk film solute concentration, and segregation energy. The steady-state solute concentration at the surface is found to increase upon increasing either the solute diffusivity or the magnitude of the (negative) segregation energy, or upon decreasing the deposition rate. The transient concentration profile at the start of deposition relaxes toward the steady-state profile as 1/t. Implications of the present results for film growth mechanisms and methods to control the degree of segregation via manipulation of deposition parameters are discussed.

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Publication fingerprints text

100
surfaces INIS
100
deposition INIS
100
segregation INIS
100
Surface Engineering
100
Energy Engineering Engineering
100
Transients Engineering
100
Solute Engineering
100
Diffusivity Engineering
100
Deposition Rate Engineering
100
Solute Concentratio... Engineering
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Citation Format(s)

[ RIS ] [ BibTeX ]
Surface segregation during deposition. / Eykholt, R.; Srolovitz, D. J.
In: Journal of Applied Physics, Vol. 60, No. 5, 01.09.1986, p. 1793-1796.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review