Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies

Paul K. Chu

doi:10.1109/ICSICT.2012.6467699

Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

Abstract

Plasma-based surface treatment techniques such as plasma immersion ion implantation and deposition (PIII&D) is a very useful technique in the fabrication of silicon-on-insulator and high-k dielectrics and is commercially used to produce shallow junctions in deep-submicrometer integrated circuits. The applications of PIII are in fact much broader covering many other areas such as metallurgy and particularly biomedical engineering and optoelectronics. Many of the innovations and protocols developed for PIII&D in semiconductor applications have been translated to the processing of biomedical components. In this invited talk, our recent work pertaining to surface treatment of optoelectronic and biomedical materials is reviewed. © 2012 IEEE.

Original language	English
Title of host publication	ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings
DOIs	https://doi.org/10.1109/ICSICT.2012.6467699
Publication status	Published - 2012
Event	2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012 - Xi'an, China Duration: 29 Oct 2012 → 1 Nov 2012

Conference

Conference	2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012
Place	China
City	Xi'an
Period	29/10/12 → 1/11/12

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10.1109/ICSICT.2012.6467699

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title = "Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies",

abstract = "Plasma-based surface treatment techniques such as plasma immersion ion implantation and deposition (PIII&D) is a very useful technique in the fabrication of silicon-on-insulator and high-k dielectrics and is commercially used to produce shallow junctions in deep-submicrometer integrated circuits. The applications of PIII are in fact much broader covering many other areas such as metallurgy and particularly biomedical engineering and optoelectronics. Many of the innovations and protocols developed for PIII&D in semiconductor applications have been translated to the processing of biomedical components. In this invited talk, our recent work pertaining to surface treatment of optoelectronic and biomedical materials is reviewed. {\textcopyright} 2012 IEEE.",

author = "Chu, {Paul K.}",

year = "2012",

doi = "10.1109/ICSICT.2012.6467699",

language = "English",

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booktitle = "ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings",

note = "2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012 ; Conference date: 29-10-2012 Through 01-11-2012",

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Chu, PK 2012, Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies. in ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings., 6467699, 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012, Xi'an, China, 29/10/12. https://doi.org/10.1109/ICSICT.2012.6467699

Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies. / Chu, Paul K.
ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings. 2012. 6467699.

Research output: Chapters, Conference Papers, Creative and Literary Works › RGC 32 - Refereed conference paper (with host publication) › peer-review

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T1 - Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies

AU - Chu, Paul K.

PY - 2012

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N2 - Plasma-based surface treatment techniques such as plasma immersion ion implantation and deposition (PIII&D) is a very useful technique in the fabrication of silicon-on-insulator and high-k dielectrics and is commercially used to produce shallow junctions in deep-submicrometer integrated circuits. The applications of PIII are in fact much broader covering many other areas such as metallurgy and particularly biomedical engineering and optoelectronics. Many of the innovations and protocols developed for PIII&D in semiconductor applications have been translated to the processing of biomedical components. In this invited talk, our recent work pertaining to surface treatment of optoelectronic and biomedical materials is reviewed. © 2012 IEEE.

AB - Plasma-based surface treatment techniques such as plasma immersion ion implantation and deposition (PIII&D) is a very useful technique in the fabrication of silicon-on-insulator and high-k dielectrics and is commercially used to produce shallow junctions in deep-submicrometer integrated circuits. The applications of PIII are in fact much broader covering many other areas such as metallurgy and particularly biomedical engineering and optoelectronics. Many of the innovations and protocols developed for PIII&D in semiconductor applications have been translated to the processing of biomedical components. In this invited talk, our recent work pertaining to surface treatment of optoelectronic and biomedical materials is reviewed. © 2012 IEEE.

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DO - 10.1109/ICSICT.2012.6467699

M3 - RGC 32 - Refereed conference paper (with host publication)

SN - 9781467324724

BT - ICSICT 2012 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, Proceedings

T2 - 2012 IEEE 11th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2012

Y2 - 29 October 2012 through 1 November 2012

ER -

Surface modification of optoelectronic and biomedical materials using plasma-based and related technologies

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