TY - JOUR
T1 - Surface-dependent chemical properties of silicon nanowires
T2 - The acceleration of copper oxidation
AU - Liao, Fan
AU - Liu, Shanshan
AU - Shao, Mingwang
AU - Lee, Shuit-Tong
PY - 2012/2/27
Y1 - 2012/2/27
N2 - HF-treated silicon nanowires exhibited surface-dependent chemical property and accelerated the oxidation rate of copper with the enhancement factor of 10 000, confirmed by x-ray diffraction semi-quantitative analysis. This unexpected oxidation characteristic would make HF-treated silicon nanowires valuable for catalysis applications. © 2012 American Institute of Physics.
AB - HF-treated silicon nanowires exhibited surface-dependent chemical property and accelerated the oxidation rate of copper with the enhancement factor of 10 000, confirmed by x-ray diffraction semi-quantitative analysis. This unexpected oxidation characteristic would make HF-treated silicon nanowires valuable for catalysis applications. © 2012 American Institute of Physics.
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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-84863247950&origin=recordpage
U2 - 10.1063/1.3691943
DO - 10.1063/1.3691943
M3 - RGC 21 - Publication in refereed journal
SN - 0003-6951
VL - 100
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 9
M1 - 93114
ER -