Surface chemistry of CVD diamond : linking the nanoscale and mesoscale modelling hierarchies
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Pages (from-to) | 275-284 |
Journal / Publication | Materials Research Society Symposium - Proceedings |
Volume | 538 |
Publication status | Published - 1998 |
Externally published | Yes |
Conference
Title | Proceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' |
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City | Boston, MA, USA |
Period | 30 November - 3 December 1998 |
Link(s)
Abstract
The β-scission growth mechanism at the diamond (100)(2×1) surface is studied by a combination of nanoscale ab-initio LDA/GGA and semiempirical tight-binding techniques to provide the necessary input into the mesoscale variable time step Kinetic Monte-Carlo (KMC) simulations of CVD diamond growth. The reaction path of the beta-scission reaction is critically examined and the activation barrier of the reverse etching of the methylene adsorbate is deduced. Our quantum mechanical calculations support a previous semiempirical PM3 study confirming that the molecular mechanics values for the enthalpy of the reaction are a factor of 2 wrong. This conclusion provides strong support for the preferential etching mechanism introduced into KMC to predict experimentally measured growth rates.
Citation Format(s)
Surface chemistry of CVD diamond: linking the nanoscale and mesoscale modelling hierarchies. / Oleinik, I. I.; Pettifor, D. G.; Sutton, A. P. et al.
In: Materials Research Society Symposium - Proceedings, Vol. 538, 1998, p. 275-284.
In: Materials Research Society Symposium - Proceedings, Vol. 538, 1998, p. 275-284.
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review