Sub-kT/q switching in In2O3 nanowire negative capacitance field-effect transistors
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
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Original language | English |
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Pages (from-to) | 19131-19139 |
Journal / Publication | Nanoscale |
Volume | 10 |
Issue number | 40 |
Online published | 18 Sep 2018 |
Publication status | Published - 28 Oct 2018 |
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Abstract
Limited by the Boltzmann distribution of electrons, the sub-threshold swing (SS) of conventional MOSFETs cannot be less than 60 mV dec-1. This limitation hinders the reduction of power dissipation of the devices. Herein, we present high-performance In2O3 nanowire (NW) negative capacitance field-effect transistors (NC-FETs) by introducing a ferroelectric P(VDF-TrFE) layer in a gate dielectric stack. The fabricated devices exhibit excellent gate modulation with a high saturation current density of 550 μA μm-1 and an outstanding SS value less than 60 mV dec-1 for over 4 decades of channel current. The assembled inverter circuit can demonstrate an impressive voltage gain of 25 and a cut-off frequency of over 10 MHz. By utilizing the self-aligned fabrication scheme, the device can be ultimately scaled down to below 100 nm channel length. The devices with 200 nm channel length exhibit the best performances, in which a high on/off current ratio of >107, a large output current density of 960 μA μm-1 and a small SS value of 42 mV dec-1 are obtained at the same time. All these would not only evidently demonstrate the potency of NW NC-FETs to break through the Boltzmann limit in nanoelectronics, but also open up a new avenue to low-power transistors for portable products.
Citation Format(s)
Sub-kT/q switching in In2O3 nanowire negative capacitance field-effect transistors. / Su, Meng; Zou, Xuming; Gong, Youning; Wang, Jianlu; Liu, Yuan; Ho, Johnny C.; Liu, Xingqiang; Liao, Lei.
In: Nanoscale, Vol. 10, No. 40, 28.10.2018, p. 19131-19139.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review