Study of TiAlN Coatings Deposited by Continuous High Power Magnetron Sputtering (C-HPMS)

Research output: Conference Papers (RGC: 31A, 31B, 32, 33)32_Refereed conference paper (no ISBN/ISSN)peer-review

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Author(s)

  • Xiaoyuan Li
  • Zhongcan Wu
  • Suihan Cui
  • Tijun Li
  • Xiubo Tian
  • Ricky KY Fu
  • ZHongzhen Wu

Detail(s)

Original languageEnglish
Publication statusPublished - 2019

Conference

Title15th International Conference on Plasma Based Ion Implantation & Deposition (PBII&D 2019)
LocationSheraton Shenzhen Nanshan
PlaceChina
CityShenzhen
Period19 - 22 December 2019

Abstract

Ions have better controllability as the energy and angle can be regulated by electromagnetic field, and consequently the film structures and properties can be tailored easily. High power impulse magnetron sputtering (HiPIMS) and arc ion plating (AIP) are the two general methods to generate highly ionized plasmas in physical vapor deposition. However, they are limited by rapid deposition and particle-free, respectively. Here, we propose a continuous high power magnetron sputtering (C-HPMS) technology which can produce high ionization like HiPIMS and high deposition rate like AIP. Al-rich TiAlN coatings are deposited by C-HPMS, HiPIMS and AIP and all the differences in the deposition process and the coatingsself are studied comparatively. The results show that no particles or defects can be observed on the coating surface deposited by C-HPMS compared to that deposited by AIP and the lowest surface roughness is 17.8 nm. A largest deposition rate of 450 nm/min is obtained by C-HPMS while those of HiPIMS and AIP are only 85 nm/min and 225 nm/min, respectively. All the coatings show comparable largest hardness which are 34.4 GPa, 33.8 GPa and 35.1 GPa for CHPMS, HiPIMS and AIP, however, C-HPMS has the densest coating structures and the smallest residual stress of -0.29 GPa/μm. Therefore, the TiAlN coatings prepared by C-HPMS also has obvious superiority in adhesion, tribology, corrosion and high temperature oxidation resistance, etc. The results reveal that C-HPMS is a much impressive deposition method for the droplet free hard coatings due to the both high ionization and rapid deposition.

Citation Format(s)

Study of TiAlN Coatings Deposited by Continuous High Power Magnetron Sputtering (C-HPMS). / Liu, Liangliang; Li, Xiaoyuan; Wu, Zhongcan; Cui, Suihan; Li, Tijun; Tian, Xiubo; Fu, Ricky KY; Chu, Paul K; Wu, ZHongzhen.

2019. Paper presented at 15th International Conference on Plasma Based Ion Implantation & Deposition (PBII&D 2019), Shenzhen, China.

Research output: Conference Papers (RGC: 31A, 31B, 32, 33)32_Refereed conference paper (no ISBN/ISSN)peer-review