Study of Ni metallization in macroporous Si using wet chemistry for radio frequency cross-talk isolation in mixed signal integrated circuits

Xi Zhang*, Chengkun Xu, Kyuchul Chong, King-Ning Tu, Ya-Hong Xie

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

1 Citation (Scopus)
46 Downloads (CityUHK Scholars)

Abstract

A highly conductive moat or Faraday cage of through-the-wafer thickness in Si substrate was proposed to be effective in shielding electromagnetic interference thereby reducing radio frequency (RF) cross-talk in high performance mixed signal integrated circuits. Such a structure was realized by metallization of selected ultra-high-aspect-ratio macroporous regions that were electrochemically etched in p- Si substrates. The metallization process was conducted by means of wet chemistry in an alkaline aqueous solution containing Ni2+ without reducing agent. It is found that at elevated temperature during immersion, Ni2+ was rapidly reduced and deposited into macroporous Si and a conformal metallization of the macropore sidewalls was obtained in a way that the entire porous Si framework was converted to Ni. A conductive moat was as a result incorporated into p- Si substrate. The experimentally measured reduction of crosstalk in this structure is 5~18 dB at frequencies up to 35 GHz. © 2011 by the authors.
Original languageEnglish
Pages (from-to)952-962
JournalMaterials
Volume4
Issue number6
DOIs
Publication statusPublished - 2011
Externally publishedYes

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Research Keywords

  • Macroporous Si
  • Ni metallization
  • RF cross-talk isolation

Publisher's Copyright Statement

  • This full text is made available under CC-BY 3.0. https://creativecommons.org/licenses/by/3.0/

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