Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

H. S. Chou; J. C. Huang; L. W. Chang; T. G. Nieh

doi:10.1063/1.2999592

Author(s)

H. S. Chou
J. C. Huang
L. W. Chang
T. G. Nieh

Detail(s)

Original language	English
Article number	191901
Journal / Publication	Applied Physics Letters
Volume	93
Issue number	19
Publication status	Published - 10 Nov 2008
Externally published	Yes

Link(s)

DOI	DOI https://doi.org/10.1063/1.2999592 Final Published version
	Check@CityULib
Link to Scopus	https://www.scopus.com/record/display.uri?eid=2-s2.0-56249085561&origin=recordpage
Permanent Link	https://scholars.cityu.edu.hk/en/publications/publication(487d6257-d87a-4d91-9808-ada0820ee1d3).html

Abstract

Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-T_g annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-T_g annealed Zr ₅₂Cu₂₉Ti₁₉ films offer great potential for microelectromechanical system applications.

Citation Format(s)

[ RIS ] [ BibTeX ]

Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films. / Chou, H. S.; Huang, J. C.; Chang, L. W. et al.
In: Applied Physics Letters, Vol. 93, No. 19, 191901, 10.11.2008.

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Chou, HS, Huang, JC, Chang, LW & Nieh, TG 2008, 'Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films', Applied Physics Letters, vol. 93, no. 19, 191901. https://doi.org/10.1063/1.2999592

Chou, H. S., Huang, J. C., Chang, L. W., & Nieh, T. G. (2008). Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films. Applied Physics Letters, 93(19), Article 191901. https://doi.org/10.1063/1.2999592

Chou HS, Huang JC, Chang LW, Nieh TG. Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films. Applied Physics Letters. 2008 Nov 10;93(19):191901. doi: 10.1063/1.2999592

Chou, H. S. ; Huang, J. C. ; Chang, L. W. et al. / Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films. In: Applied Physics Letters. 2008 ; Vol. 93, No. 19.