Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

H. S. Chou; J. C. Huang; L. W. Chang; T. G. Nieh

doi:10.1063/1.2999592

Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

H. S. Chou
, J. C. Huang^*
, L. W. Chang
, T. G. Nieh

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

75 Citations (Scopus)

Abstract

Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-T_g annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-T_g annealed Zr ₅₂Cu₂₉Ti₁₉ films offer great potential for microelectromechanical system applications.

Original language	English
Article number	191901
Journal	Applied Physics Letters
Volume	93
Issue number	19
DOIs	https://doi.org/10.1063/1.2999592
Publication status	Published - 10 Nov 2008
Externally published	Yes

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title = "Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films",

abstract = "Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19\%. Sub-Tg annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35\% to 6.6 GPa. The promising mechanical properties of the sub-Tg annealed Zr 52Cu29Ti19 films offer great potential for microelectromechanical system applications.",

author = "Chou, \{H. S.\} and Huang, \{J. C.\} and Chang, \{L. W.\} and Nieh, \{T. G.\}",

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journal = "Applied Physics Letters",

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T1 - Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

AU - Chou, H. S.

AU - Huang, J. C.

AU - Chang, L. W.

AU - Nieh, T. G.

PY - 2008/11/10

Y1 - 2008/11/10

N2 - Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-Tg annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-Tg annealed Zr 52Cu29Ti19 films offer great potential for microelectromechanical system applications.

AB - Ternary Zr-Cu-Ti system, especial with a high Ti content, is normally difficult to be fully vitrified. In this paper, we demonstrate that cosputtering can produce amorphous Zr-Cu-Ti thin films with an excessive Ti content even as high as 19%. Sub-Tg annealing of the film induces the formation of medium-range-ordered clusters and to raise the nanohardness by 35% to 6.6 GPa. The promising mechanical properties of the sub-Tg annealed Zr 52Cu29Ti19 films offer great potential for microelectromechanical system applications.

UR - https://www.scopus.com/pages/publications/56249085561

UR - https://www.scopus.com/pages/publications/56249085561#tab=impact

U2 - 10.1063/1.2999592

DO - 10.1063/1.2999592

M3 - RGC 21 - Publication in refereed journal

SN - 0003-6951

VL - 93

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

M1 - 191901

ER -

Structural relaxation and nanoindentation response in Zr-Cu-Ti amorphous thin films

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