Structural properties and nitrogen-loss characteristics in sputtered tungsten nitride films

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

43 Scopus Citations
View graph of relations

Author(s)

  • Y.G. Shen
  • Y.W. Mai
  • W.E. McBride
  • Q.C. Zhang
  • D.R. McKenzie

Detail(s)

Original languageEnglish
Pages (from-to)257-264
Journal / PublicationThin Solid Films
Volume372
Issue number1-2
Online published18 Aug 2000
Publication statusPublished - 1 Sep 2000
Externally publishedYes

Abstract

A combination of X-ray photoelectron spectroscopy (XPS), parallel electron energy-loss spectroscopy (PEELS), X-ray diffraction (XRD), transmission electron microscopy (TEM) and transmission electron diffraction (TED) were used to investigate structural properties and nitrogen-loss characteristics of thin WNx films prepared by reactive magnetron sputtering of tungsten in an Ar-N2 gas mixture. XRD θ-2θ scans combined with plan-view and cross-sectional TEM showed that the as-deposited WNx films were amorphous in structure. Annealing of the as-deposited films at 600°C or above resulted in crystallization of the amorphous phases, forming either a two-phase structure consisting of W2N and b.c.c. W or a single-phase structure of W2N, which was related to the initial nitrogen concentration in the films. The 150-nm thick crystalline films near a stoichiometry of W2N had a columnar microstructure with an average column width of 15-20 nm near the film surface, whereas the column grains were larger for substoichiometric films. Thermal stability and nitrogen-loss characteristics of nitride films were also studied by in situ annealing in the TEM and PEELS system. The results indicate that between 600 and 800°C the W2N phase was stable. Nitrogen in the film started to evaporate to vacuum at approximately 820 °C and was fully released after 900°C annealing.

Research Area(s)

  • Nitrogen, Nitride thin films, Tungsten, Magnetron sputtering

Citation Format(s)

Structural properties and nitrogen-loss characteristics in sputtered tungsten nitride films. / Shen, Y.G.; Mai, Y.W.; McBride, W.E.; Zhang, Q.C.; McKenzie, D.R.

In: Thin Solid Films, Vol. 372, No. 1-2, 01.09.2000, p. 257-264.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review