Skip to main navigation Skip to search Skip to main content

Structural analysis of cubic boron nitride films by ultraviolet Raman spectroscopy

  • K. M. Leung
  • , H. Q. Li
  • , Y. S. Zou
  • , K. L. Ma
  • , Y. M. Chong
  • , Q. Ye
  • , W. J. Zhang
  • , S. T. Lee
  • , I. Bello

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Cubic boron nitride (BN) films with improved crystallinity are deposited by physical vapor deposition at an extremely low substrate bias (-35 V). The films are characterized by UV Raman in association with Fourier transformed infrared (FTIR) spectroscopy. The influences of bias voltage and film thickness on the characterizations are investigated. UV Raman, in contrast to FTIR, is demonstrated to be a more powerful tool with high sensitivity for quantitative and/or qualitative evaluation of the phase purity and crystallinity, especially as the film thickness increases. Hexagonal BN inclusions (less than 1%), not evident in FTIR, are clearly revealed by UV Raman analysis. © 2006 American Institute of Physics.
Original languageEnglish
Article number241922
JournalApplied Physics Letters
Volume88
Issue number24
DOIs
Publication statusPublished - 12 Jun 2006

Fingerprint

Dive into the research topics of 'Structural analysis of cubic boron nitride films by ultraviolet Raman spectroscopy'. Together they form a unique fingerprint.

Cite this