Strain Engineering of Twisted Bilayer Graphene: The Rise of Strain-Twistronics

Yuan Hou, Jingzhuo Zhou, Minmin Xue, Maolin Yu, Ying Han, Zhuhua Zhang*, Yang Lu*

*Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

28 Citations (Scopus)
45 Downloads (CityUHK Scholars)

Abstract

The layer-by-layer stacked van der Waals structures (termed vdW hetero/homostructures) offer a new paradigm for materials design—their physical properties can be tuned by the vertical stacking sequence as well as by adding a mechanical twist, stretch, and hydrostatic pressure to the atomic structure. In particular, simple twisting and stacking of two layers of graphene can form a uniform and ordered Moiré superlattice, which can effectively modulate the electrons of graphene layers and lead to the discovery of unconventional superconductivity and strong correlations. However, the twist angle of twisted bilayer graphene (tBLG) is almost unchangeable once the interlayer stacking is determined, while applying mechanical elastic strain provides an alternative way to deeply regulate the electronic structure by controlling the lattice spacing and symmetry. In this review, diverse experimental advances are introduced in straining tBLG by in-plane and out-of-plane modes, followed by the characterizations and calculations toward quantitatively tuning the strain-engineered electronic structures. It is further discussed that the structural relaxation in strained Moiré superlattice and its influence on electronic structures. Finally, the conclusion entails prospects for opportunities of strained twisted 2D materials, discussions on existing challenges, and an outlook on the intriguing emerging field, namely “strain-twistronics”. © 2024 The Authors. Small published by Wiley-VCH GmbH.
Original languageEnglish
Article number2311185
Number of pages14
JournalSmall
Volume21
Issue number28
Online published15 Apr 2024
DOIs
Publication statusPublished - 17 Jul 2025

Funding

Y.H. and J.Z. contributed equally to this work. This work was sup-ported by the NSFC/RGC Joint Research Scheme (N_HKU159/22);Shenzhen-Hong Kong-Macau Technology Research Program (Type C,SGDX2020110309300301); Research Grants Council of the Hong KongSpecial Administrative Region, China under grant RFS2021-1S05 and Na-tional Natural Science Foundation of China (No. 12261160367). Y.H.thanks X. Cui, D. Zhao, M. Luo, N, Gross and C. Yen for their useful dis-cussions.

Research Keywords

  • 2D materials
  • nanomechanics
  • strain engineering
  • twisted bilayer graphene
  • twistronics

Publisher's Copyright Statement

  • This full text is made available under CC-BY-NC-ND 4.0. https://creativecommons.org/licenses/by-nc-nd/4.0/

RGC Funding Information

  • RGC-funded

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