Abstract
Straight beta-silicon carbide nanorods have been grown on silicon wafers using hot filament chemical vapor deposition with iron particles as catalyst. A plate made of a C-Si-SiO2 powder mixture was used as carbon and silicon sources. Hydrogen, which was the only gas fed into the deposition system, acts both as a reactant and as a mass transporting medium. The diameter of the β-SiC nanorod ranged from 20 to 70 nm, while its length was approximately 1 μm. A growth mechanism of beta-silicon carbide nanorods was proposed. The field emission properties of the beta-silicon carbide nanorods grown on the silicon substrate are also reported. © 2000 American Institute of Physics.
| Original language | English |
|---|---|
| Pages (from-to) | 294-296 |
| Journal | Applied Physics Letters |
| Volume | 76 |
| Issue number | 3 |
| DOIs | |
| Publication status | Published - 17 Jan 2000 |
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