Stability of nanoscale twins in copper under electric current stressing
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review
Author(s)
Detail(s)
Original language | English |
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Article number | 066103 |
Journal / Publication | Journal of Applied Physics |
Volume | 108 |
Issue number | 6 |
Publication status | Published - 15 Sept 2010 |
Externally published | Yes |
Link(s)
Abstract
Migration of {112} incoherent twin boundary (ITB) in nanotwinned Cu under electric current stressing has been observed using in situ high-resolution transmission electron microscopy. The current-driven ITB migration is found to be four orders of magnitude faster than that driven thermally. We propose that electric current plays a role of shuffling Cu atoms at ITB/coherent twin boundary junctions, which enhances nucleation of {112} steps and facilitates twin boundary migration in Cu. By understanding how twin boundaries respond to electric current force we shall be able to trace the property change in nanotwinned Cu under electric current stressing, which would be an essential assessment of interconnect reliability. © 2010 American Institute of Physics.
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Citation Format(s)
Stability of nanoscale twins in copper under electric current stressing. / Chen, Kuan-Chia; Wu, Wen-Wei; Liao, Chien-Neng et al.
In: Journal of Applied Physics, Vol. 108, No. 6, 066103, 15.09.2010.
In: Journal of Applied Physics, Vol. 108, No. 6, 066103, 15.09.2010.
Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review