Stability of functional polymers after plasticizer-assisted imprint lithography

R. M. Reano; Y. P. Kong; H. Y. Low; L. Tan; F. Wang; S. W. Pang; A. F. Yee

doi:10.1116/1.1825013

Stability of functional polymers after plasticizer-assisted imprint lithography

R. M. Reano
, Y. P. Kong
, H. Y. Low
, L. Tan
, F. Wang
, S. W. Pang^*
, A. F. Yee

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

11 Citations (Scopus)

Abstract

Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5 min at 80°C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80°C, whereas the chemical functionality is not affected by pressure up to 1 MPa. Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O ₂ plasma. © 2004 American Vacuum Society.

Original language	English
Pages (from-to)	3294-3299
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	22
Issue number	6
DOIs	https://doi.org/10.1116/1.1825013
Publication status	Published - Nov 2004
Externally published	Yes

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@article{22cc08b5fa0b4934b2bbb7777c20ed49,

title = "Stability of functional polymers after plasticizer-assisted imprint lithography",

abstract = "Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5 min at 80°C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80°C, whereas the chemical functionality is not affected by pressure up to 1 MPa. Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O 2 plasma. {\textcopyright} 2004 American Vacuum Society.",

author = "Reano, \{R. M.\} and Kong, \{Y. P.\} and Low, \{H. Y.\} and L. Tan and F. Wang and Pang, \{S. W.\} and Yee, \{A. F.\}",

year = "2004",

month = nov,

doi = "10.1116/1.1825013",

language = "English",

volume = "22",

pages = "3294--3299",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "0734-211X",

publisher = "American Institute of Physics",

number = "6",

}

TY - JOUR

T1 - Stability of functional polymers after plasticizer-assisted imprint lithography

AU - Reano, R. M.

AU - Kong, Y. P.

AU - Low, H. Y.

AU - Tan, L.

AU - Wang, F.

AU - Pang, S. W.

AU - Yee, A. F.

PY - 2004/11

Y1 - 2004/11

N2 - Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5 min at 80°C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80°C, whereas the chemical functionality is not affected by pressure up to 1 MPa. Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O 2 plasma. © 2004 American Vacuum Society.

AB - Poly(3,4-ethylenedioxythiophene) (PEDOT) and chitosan structures on Si, patterned by plasticizer-assisted imprint lithography (PAIL), are examined under a variety of imprinting conditions. The stabilities of pattern dimension and chemical functionality of these polymers are presented. Thermal annealing for 5 min at 80°C is found to be an effective method to stabilize imprinted PEDOT patterns. Biofunctionality in chitosan as a function of imprint temperature and pressure is examined through fluorescence spectroscopy. The accessibility of the amine group of chitosan is observed to decrease for imprint temperatures above 80°C, whereas the chemical functionality is not affected by pressure up to 1 MPa. Fluorescence spectra of the chitosan are observed to be strong functions of exposure time to O 2 plasma. © 2004 American Vacuum Society.

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UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-13244294184&origin=recordpage

U2 - 10.1116/1.1825013

DO - 10.1116/1.1825013

M3 - RGC 21 - Publication in refereed journal

SN - 0734-211X

VL - 22

SP - 3294

EP - 3299

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 6

ER -

Stability of functional polymers after plasticizer-assisted imprint lithography

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