Sputtering of Cu thin films on Ru(0001) by Ne+ ion bombardment

Y. G. Shen; D. J. O'Connor; R. J. MacDonald

doi:10.1016/0168-583X(95)00678-8

Sputtering of Cu thin films on Ru(0001) by Ne⁺ ion bombardment

Y. G. Shen^*
, D. J. O'Connor
, R. J. MacDonald

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

Abstract

Ion induced desorption cross sections for Cu thin films (≤ 1 ML) on Ru(0001) have been measured by bombardment with Ne⁺ ions. The accurate calibration of the Cu coverage was carried out by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS measurement. At 1 ML of Cu coverage, the desorption cross section was measured to be σ_D ∼ 2.03 × 10^-15 ions/cm², or a sputtering yield of Y ∼ 3.2 at 1 keV. Application of binary collision sputtering models indicates that for E₀ > 400 eV the Cu atoms are mainly removed by sputtered Ru atoms moving outward through the surface region. © 1995.

Original language	English
Pages (from-to)	55-59
Journal	Nuclear Inst. and Methods in Physics Research, B
Volume	106
Issue number	1-4
DOIs	https://doi.org/10.1016/0168-583X(95)00678-8
Publication status	Published - 2 Dec 1995
Externally published	Yes

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@article{791a43be0a47491583d013f5a7409aea,

title = "Sputtering of Cu thin films on Ru(0001) by Ne+ ion bombardment",

abstract = "Ion induced desorption cross sections for Cu thin films (≤ 1 ML) on Ru(0001) have been measured by bombardment with Ne+ ions. The accurate calibration of the Cu coverage was carried out by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS measurement. At 1 ML of Cu coverage, the desorption cross section was measured to be σD ∼ 2.03 × 10-15 ions/cm2, or a sputtering yield of Y ∼ 3.2 at 1 keV. Application of binary collision sputtering models indicates that for E0 > 400 eV the Cu atoms are mainly removed by sputtered Ru atoms moving outward through the surface region. {\textcopyright} 1995.",

author = "Shen, \{Y. G.\} and O'Connor, \{D. J.\} and MacDonald, \{R. J.\}",

year = "1995",

month = dec,

day = "2",

doi = "10.1016/0168-583X(95)00678-8",

language = "English",

volume = "106",

pages = "55--59",

journal = "Nuclear Inst. and Methods in Physics Research, B",

issn = "0168-583X",

publisher = "Elsevier B.V.",

number = "1-4",

}

TY - JOUR

T1 - Sputtering of Cu thin films on Ru(0001) by Ne+ ion bombardment

AU - Shen, Y. G.

AU - O'Connor, D. J.

AU - MacDonald, R. J.

PY - 1995/12/2

Y1 - 1995/12/2

N2 - Ion induced desorption cross sections for Cu thin films (≤ 1 ML) on Ru(0001) have been measured by bombardment with Ne+ ions. The accurate calibration of the Cu coverage was carried out by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS measurement. At 1 ML of Cu coverage, the desorption cross section was measured to be σD ∼ 2.03 × 10-15 ions/cm2, or a sputtering yield of Y ∼ 3.2 at 1 keV. Application of binary collision sputtering models indicates that for E0 > 400 eV the Cu atoms are mainly removed by sputtered Ru atoms moving outward through the surface region. © 1995.

AB - Ion induced desorption cross sections for Cu thin films (≤ 1 ML) on Ru(0001) have been measured by bombardment with Ne+ ions. The accurate calibration of the Cu coverage was carried out by Auger electron spectroscopy (AES), low energy electron diffraction (LEED) and low energy ion scattering (LEIS). Decreases in surface Cu as a function of ion dose were monitored for various Cu coverages by LEIS measurement. At 1 ML of Cu coverage, the desorption cross section was measured to be σD ∼ 2.03 × 10-15 ions/cm2, or a sputtering yield of Y ∼ 3.2 at 1 keV. Application of binary collision sputtering models indicates that for E0 > 400 eV the Cu atoms are mainly removed by sputtered Ru atoms moving outward through the surface region. © 1995.

UR - https://www.scopus.com/pages/publications/58149210008

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-58149210008&origin=recordpage

U2 - 10.1016/0168-583X(95)00678-8

DO - 10.1016/0168-583X(95)00678-8

M3 - RGC 21 - Publication in refereed journal

SN - 0168-583X

VL - 106

SP - 55

EP - 59

JO - Nuclear Inst. and Methods in Physics Research, B

JF - Nuclear Inst. and Methods in Physics Research, B

IS - 1-4

ER -