TY - JOUR
T1 - Special 10kV solid state power modulator for plasma immersion ion implantation treatment of industrial bearings
AU - Tang, B. Y.
AU - Wang, L. P.
AU - Chu, P. K.
AU - Gan, K. Y.
AU - Wang, X. F.
AU - Wang, S. Y.
PY - 2001
Y1 - 2001
N2 - We have recently developed a 10kV solid state power modulator for the processing of industrial bearings by plasma immersion ion implantation. According to our research results, high energy implantation is not preferred in the treatment of industrial bearings because of the geometry of the races, and a dedicated and less expensive power supply will suffice. In our new design, optical communication modules are used to synchronize the control pulse of each IGBT and a new method is used to generate power for the IGBT gate drive in the solid state modulator. In addition to a maximum voltage of 10kV, our inexpensive power modulator can output pulses 2 to 100 microseconds in duration with a rise time of 2 microseconds. The maximum pulsing frequency is 2kHz. We will present the details of the design and the experimental results in this paper.
AB - We have recently developed a 10kV solid state power modulator for the processing of industrial bearings by plasma immersion ion implantation. According to our research results, high energy implantation is not preferred in the treatment of industrial bearings because of the geometry of the races, and a dedicated and less expensive power supply will suffice. In our new design, optical communication modules are used to synchronize the control pulse of each IGBT and a new method is used to generate power for the IGBT gate drive in the solid state modulator. In addition to a maximum voltage of 10kV, our inexpensive power modulator can output pulses 2 to 100 microseconds in duration with a rise time of 2 microseconds. The maximum pulsing frequency is 2kHz. We will present the details of the design and the experimental results in this paper.
UR - http://www.scopus.com/inward/record.url?scp=17444447037&partnerID=8YFLogxK
UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-17444447037&origin=recordpage
U2 - 10.1109/PPPS.2001.961184
DO - 10.1109/PPPS.2001.961184
M3 - RGC 22 - Publication in policy or professional journal
SN - 0730-9244
JO - IEEE International Conference on Plasma Science
JF - IEEE International Conference on Plasma Science
T2 - 28th IEEE International Conference on Plasma Science / 13th IEEE International Pulsed Power Conference
Y2 - 17 June 2001 through 22 June 2001
ER -