Soft lithography using acryloxy perfluoropolyether composite stamps

Tu T. Truong; Rongsheng Lin; Seokwoo Jeon; Hee Hyun Lee; Joana Maria; Anshu Gaur; Feng Hua; Ines Meinel; John A. Rogers

doi:10.1021/la062981k

Soft lithography using acryloxy perfluoropolyether composite stamps

Tu T. Truong
, Rongsheng Lin
, Seokwoo Jeon
, Hee Hyun Lee
, Joana Maria
, Anshu Gaur
, Feng Hua
, Ines Meinel
, John A. Rogers^*

^*Corresponding author for this work

Research output: Journal Publications and Reviews › RGC 21 - Publication in refereed journal › peer-review

136 Citations (Scopus)

Abstract

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm ^-1), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS). © 2007 American Chemical Society.

Original language	English
Pages (from-to)	2898-2905
Journal	Langmuir
Volume	23
Issue number	5
DOIs	https://doi.org/10.1021/la062981k
Publication status	Published - 27 Feb 2007
Externally published	Yes

Bibliographical note

Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

Access Output

10.1021/la062981k

Other Access Options

Check CityUHK Library

Permanent Link

Right click to copy link

Cite this

@article{648877d7a9b64e9891f1de72cde001ed,

title = "Soft lithography using acryloxy perfluoropolyether composite stamps",

abstract = "This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm -1), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS). {\textcopyright} 2007 American Chemical Society.",

author = "Truong, \{Tu T.\} and Rongsheng Lin and Seokwoo Jeon and Lee, \{Hee Hyun\} and Joana Maria and Anshu Gaur and Feng Hua and Ines Meinel and Rogers, \{John A.\}",

note = "Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].",

year = "2007",

month = feb,

day = "27",

doi = "10.1021/la062981k",

language = "English",

volume = "23",

pages = "2898--2905",

journal = "Langmuir",

issn = "0743-7463",

publisher = "American Chemical Society",

number = "5",

}

TY - JOUR

T1 - Soft lithography using acryloxy perfluoropolyether composite stamps

AU - Truong, Tu T.

AU - Lin, Rongsheng

AU - Jeon, Seokwoo

AU - Lee, Hee Hyun

AU - Maria, Joana

AU - Gaur, Anshu

AU - Hua, Feng

AU - Meinel, Ines

AU - Rogers, John A.

N1 - Publication details (e.g. title, author(s), publication statuses and dates) are captured on an “AS IS” and “AS AVAILABLE” basis at the time of record harvesting from the data source. Suggestions for further amendments or supplementary information can be sent to [email protected].

PY - 2007/2/27

Y1 - 2007/2/27

N2 - This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm -1), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS). © 2007 American Chemical Society.

AB - This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm -1), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS). © 2007 American Chemical Society.

UR - https://www.scopus.com/pages/publications/33847731541

UR - https://www.scopus.com/record/pubmetrics.uri?eid=2-s2.0-33847731541&origin=recordpage

U2 - 10.1021/la062981k

DO - 10.1021/la062981k

M3 - RGC 21 - Publication in refereed journal

SN - 0743-7463

VL - 23

SP - 2898

EP - 2905

JO - Langmuir

JF - Langmuir

IS - 5

ER -

Soft lithography using acryloxy perfluoropolyether composite stamps

Abstract

Bibliographical note

Access Output

Other Access Options

Permanent Link

Other Files and Links

Fingerprint

Cite this