Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties
Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
Author(s)
Detail(s)
| Original language | English |
|---|---|
| Pages (from-to) | 2765-2768 |
| Journal / Publication | Nanoscale |
| Volume | 2 |
| Issue number | 12 |
| Online published | 8 Oct 2010 |
| Publication status | Published - 1 Dec 2010 |
| Externally published | Yes |
Link(s)
Abstract
Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.
Citation Format(s)
Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties. / Lin, Yi-Ruei; Lai, K. Y.; Wang, Hsin-Ping; He, Jr-Hau.
In: Nanoscale, Vol. 2, No. 12, 01.12.2010, p. 2765-2768.Research output: Journal Publications and Reviews (RGC: 21, 22, 62) › 21_Publication in refereed journal › peer-review
