Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review

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Author(s)

Detail(s)

Original languageEnglish
Pages (from-to)2765-2768
Journal / PublicationNanoscale
Volume2
Issue number12
Online published8 Oct 2010
Publication statusPublished - 1 Dec 2010
Externally publishedYes

Abstract

Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.

Citation Format(s)

Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties. / Lin, Yi-Ruei; Lai, K. Y.; Wang, Hsin-Ping; He, Jr-Hau.

In: Nanoscale, Vol. 2, No. 12, 01.12.2010, p. 2765-2768.

Research output: Journal Publications and Reviews (RGC: 21, 22, 62)21_Publication in refereed journalpeer-review