Abstract
Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.
| Original language | English |
|---|---|
| Pages (from-to) | 2765-2768 |
| Journal | Nanoscale |
| Volume | 2 |
| Issue number | 12 |
| Online published | 8 Oct 2010 |
| DOIs | |
| Publication status | Published - 1 Dec 2010 |
| Externally published | Yes |
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