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Slope-tunable Si nanorod arrays with enhanced antireflection and self-cleaning properties

  • Yi-Ruei Lin
  • , K. Y. Lai
  • , Hsin-Ping Wang
  • , Jr-Hau He*
  • *Corresponding author for this work

Research output: Journal Publications and ReviewsRGC 21 - Publication in refereed journalpeer-review

Abstract

Slope-tunable Si nanorod arrays (NRAs) were fabricated with colloidal lithography and reactive ion etching (RIE). Sharpened NRAs fabricated by increasing the SF6/O2 flow ratio during RIE exhibit enhanced antireflection (AR) and hydrophobic properties, which are attributed to the smooth gradient in the effective refractive index of NRAs, and the enlarged water/air interface of the water drops in the NRA layers, respectively. Enhanced AR characteristics via modifying the slope of NRAs are accompanied by broad-band working ranges, omnidirectionality, and polarization insensitivity. Detailed experimental and theoretical analysis of slope-tunable NRAs should benefit the development of various self-cleaning optoelectronic devices with efficient light management.
Original languageEnglish
Pages (from-to)2765-2768
JournalNanoscale
Volume2
Issue number12
Online published8 Oct 2010
DOIs
Publication statusPublished - 1 Dec 2010
Externally publishedYes

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